Abstract: A system of AES for surface analysis was presented. Using this system the copper deposition law with a probe electron of AES attracting in the copper fast ionic conductors CuI-Cu_2O-MoO_3-P_2O_5 was studied. It was found that some of the oxygen on the surface in such a sample decreases during the electron bombardment. The total secondary electron emission current against the time of the electron bombardment changes instantaneously owing to the copper deposition on the sample surface.