Abstract: The silver deposition in amorphous fast ionic conductor AgI-Ag_4P_2O_7 has been investigated by EPMA and the counting rate curves were given. Measurement Performed on sample showed that in the beginning, the silver content at the Points bombarded by the electron beam is increased rather rapidly. After a time, it is increased slowly, and finally attained its saturation limit. However, for the crystallized sample of AgI-Ag_4P_2O_7, the silver tons may be Provided insufficiently at the electron bombarded point for a prolonged deposition due to the hindrance of the grain boundaries in the ions transport pr ocess, the deposition attained its saturation limit rapidly. The secondary electron image and component image at the deposition point as well as AgLa X-ray scanning image at the surface of the sample after silver deposition were given. During the sliver deposition, the veined leaf-like patterns on the sample were found. They may be considered as a resuit of the crystallization of Ag and its compounds due to temperature rise of the sample caused by the electron beam during the bombardment.