Abstract:
In the field of subwavelength lithography, the rulebased subresolution assist features insertion is an important technology. Regardless of optical proximity correction effect, the conventional method needs experience to better SRAF. A new optimizing SRAF method using test patterns is presented. Combined with conventional optical proximity correction flow, it can solve problems such as small process window and SRAF printout. Edge placement error (EPE) and process window are measured and tested on the standard benchmark circuits. The EPE has decreased 10%, while all EPEs under different process windows have also bettered.