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    史学伟, 昌慧, 赵双良, 徐首红. mSiO2-IDA对Cu2+、Cd2+金属离子的吸附[J]. 华东理工大学学报(自然科学版), 2018, (2): 182-188. DOI: 10.14135/j.cnki.1006-3080.20070412003
    引用本文: 史学伟, 昌慧, 赵双良, 徐首红. mSiO2-IDA对Cu2+、Cd2+金属离子的吸附[J]. 华东理工大学学报(自然科学版), 2018, (2): 182-188. DOI: 10.14135/j.cnki.1006-3080.20070412003
    SHI Xue-wei, CHANG Hui, ZHAO Shuang-liang, XU Shou-hong. Adsorption of Cu2+ and Cd2+ onto mSiO2-IDA[J]. Journal of East China University of Science and Technology, 2018, (2): 182-188. DOI: 10.14135/j.cnki.1006-3080.20070412003
    Citation: SHI Xue-wei, CHANG Hui, ZHAO Shuang-liang, XU Shou-hong. Adsorption of Cu2+ and Cd2+ onto mSiO2-IDA[J]. Journal of East China University of Science and Technology, 2018, (2): 182-188. DOI: 10.14135/j.cnki.1006-3080.20070412003

    mSiO2-IDA对Cu2+、Cd2+金属离子的吸附

    Adsorption of Cu2+ and Cd2+ onto mSiO2-IDA

    • 摘要: 在介孔二氧化硅(mSiO2)的表面接枝了亚氨基二乙酸官能团(IDA)合成了mSiO2-IDA吸附剂,研究了mSiO2-IDA对Cu2+、Cd2+两种金属离子的吸附效果。通过元素分析仪(EA)、傅里叶红外型光谱仪(FT-IR)等表征手段表明IDA成功地接枝到mSiO2的表面,考察了溶液的pH、初始浓度和吸附时间对吸附Cu2+、Cd2+的影响。结果显示,当pH=5,t=30 min时,2 g/L mSiO2-IDA对溶液中的Cu2+、Cd2+去除率分别达到97.9%和92.1%。通过吸附动力学数据可知,拟二级动力学方程能更好地描述mSiO2-IDA对Cu2+、Cd2+的吸附过程,它属于Langmuir等温吸附模型;多功能光电子能谱仪(XPS)研究显示mSiO2-IDA对Cu2+、Cd2+的吸附机制并不相同。

       

      Abstract: Because of the non-degradability of heavy metal ions and their serious injury to the human body, removal of heavy metal ions in industrial waste water has become very urgent. The adsorption method is widely used due to simple operation, low cost, and less secondary pollution. Mesoporous SiO2 with a high specific surface, good thermal stability and mechanical property becomes a good metal adsorbent. In this study, mesoporous SiO2 functionalized by iminodiacetic acid (IDA) (mSiO2-IDA) was prepared to explore the adsorption of Cu2+ and Cd2+. The prepared mSiO2-IDA was analyzed and characterized by elemental analysis (EA) and FT-IR spectroscopy, which confirmed that IDA was successfully grafted on the surface of mSiO2. The effect of solution pH, initial metal ion concentration and time on the adsorption of Cu2+ and Cd2+ onto mSiO2-IDA was studied. The capacity of adsorption changed with the increase of pH, the maximum adsorption appeared at pH=5. Then the kinetics of adsorption at pH=5 was studied. The adsorption rates and capacity reached the maximum within 30 min. Besides, the adsorption capacity of mSiO2-IDA at different initial concentrations was studied. Adsorption capacity increased with the increase of initial concentrations and the highest adsorption capacities were 49.0 mg/g and 43.5 mg/g for Cu2+ and Cd2+ respectively. It was concluded that the removal efficiency of Cu2+ and Cd2+ achieved 97.9% and 92.1% within 30 min respectively at pH=5 by 2 g/L mSiO2-IDA. Meanwhile, in order to determine the adsorption rate constant and explore adsorption mechanism of mSiO2-IDA to Cu2+ and Cd2+, their data of adsorption kinetics were fitted. The adsorption behavior was better described by pseudo-second-order equation, and the adsorption isotherm followed Langmuir one. As revealed by X-ray photoelectron spectroscopy (XPS), the adsorption mechanisms of Cu2+ and Cd2+ onto mSiO2-IDA are different. mSiO2-IDA showed a good adsorption performance to Cu2+ and Cd2+.

       

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