Abstract:
Based on the chemical reation,nucleation,coating and gas entraning in the flu-idization chemical vapor deposition reactor,one dimentional process model of particle size,film coating and nucleation coating was established.To the SnCl_4-H_2O-N_2 system,coating rate and morphology of SnO_2 with operating parameters were studied.The results showed that the coating rate increased with increasing reation temperature and SnCl_4 flux,but the coating morphology got worse with the gas viscosity increasing,the coating rate decreased but the coating morphology got better.